Le dessin sous-jacent et la technologie dans la peinture: perspectives
schema:publication →
<na3b655c0fa594bed88cef13fe94b38c3b5>
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schema:published |
Collège Erasme |
| schema:name |
"Books"@en
|
|
schema:same |
aat:300028051 |
schema:subjectOf →
<na3b655c0fa594bed88cef13fe94b38c3b8>
| schema:text | ill. |
|
schema:additional |
<http:/ |
schema:publication →
<na3b655c0fa594bed88cef13fe94b38c3b3>
| schema:location | Louvain-la-Neuve |
schema:subjectOf →
<na3b655c0fa594bed88cef13fe94b38c3b6>
| schema:text | Colloque 14-16 septembre 1995 |
|
schema:additional |
aat:300435416 |
schema:publication →
<na3b655c0fa594bed88cef13fe94b38c3b4>
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schema:start |
"1997"^^schema:Date |
schema:subjectOf →
<na3b655c0fa594bed88cef13fe94b38c3b7>
| schema:text | Rugtitel is nog oude serietitel: Le dessin sous-jacent dans la peinture : colloque |
|
schema:additional |
aat:300435416 |
schema:publication →
Louvain-la-Neuve: Collège Erasme; 1997
| schema:name | "Louvain-la-Neuve: Collège Erasme; 1997" |
schema:publication :: schema:publishedBy →
Collège Erasme
| schema:name | "Collège Erasme" |
schema:publication :: schema:location →
Louvain-la-Neuve
| schema:name | "Louvain-la-Neuve" |