Noble-gas ion bombardment on clean silicon surfaces : studied using ellipsometry and desorption / Antonius Hendricus Maria Holtslag

<http://data.bibliotheken.nl/id/nbt/p863330088>

Auteursnaam op omslag: Toon Holtslag

rdfs:label	"Noble-gas ion bombardment on clean silicon surfaces : studied using ellipsometry and desorption / Antonius Hendricus Maria Holtslag"
schema:name	"Noble-gas ion bombardment on clean silicon surfaces : studied using ellipsometry and desorption"
schema:author	Holtslag, Antonius Hendricus Maria (1955-)
schema:description	"Auteursnaam op omslag: Toon Holtslag"
	"Proefschrift T.H. Twente"
schema:sameAs	<http://www.worldcat.org/oclc/64370821>
schema:mainEntityOfPage	<https://data.bibliotheken.nl/.well-known/genid/23f54b8caa1288659df5fa2f6ea08891>
http://purl.org/dc/terms#issued	"1986"
schema:about	vaste-stoffysica
	Rare gases
	Silicon
	Ionic implantation
	Thermische desorptie
	Ellipsometry
schema:inLanguage	"en"
schema:numberOfPages	183
schema:publication	<https://data.bibliotheken.nl/.well-known/genid/9c4fe3a87683cb0b2929328faf067dd2>