High energy ion implantation for IC processing / Sicco Oosterhoff

<http://data.bibliotheken.nl/id/nbt/p861793102>

Proefschrift Enschede, TH Twente

rdfs:label	"High energy ion implantation for IC processing / Sicco Oosterhoff"
schema:name	"High energy ion implantation for IC processing"
schema:author	Oosterhoff, Sicco (1956-)
schema:description	"Proefschrift Enschede, TH Twente"
schema:sameAs	<http://www.worldcat.org/oclc/64345503>
schema:mainEntityOfPage	<https://data.bibliotheken.nl/.well-known/genid/5fb6259a543d0a35b988e5858e8f7602>
http://purl.org/dc/terms#issued	"1986"
schema:about	elektronica
	Ionic implantation
	Micro-elektronica
schema:inLanguage	"en"
schema:numberOfPages	167
schema:publication	<https://data.bibliotheken.nl/.well-known/genid/66a58a859720f7712a831d1c30a1cf58>