High-energy ion implantation for bipolar transistor fabrication / Frederik Willem Ragay
Proefschrift Enschede, Universiteit Twente
| rdfs:label | "High-energy ion implantation for bipolar transistor fabrication / Frederik Willem Ragay" |
| schema:name | "High-energy ion implantation for bipolar transistor fabrication" |
| schema:author | Ragay, Frederik Willem (1960-) |
| schema:description | "Proefschrift Enschede, Universiteit Twente" |
| "Auteursnaam op omslag: Peter Ragay" | |
|
schema:same |
<http:/ |
|
schema:main |
<https:/ |
|
http:/ |
"1991" |
| schema:about | Micro-elektronica |
|
<http:/ |
|
| chips | |
| transistoren | |
| Ionic implantation | |
| Twente (Enschede) | |
| Transistors | |
|
schema:in |
"en" |
| schema:isbn | "9090038833" |
|
schema:number |
172 |
| schema:publication |
<https:/ |